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Name: Dr. Rakesh Sohal

Designation: Assistant Professor

Department: Department of Physics

Email: dr.rakeshsohal@rjit.ac.in

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Date of Joining: 30-Nov--0001

Education & Qualification:

M.Sc. (Physics) from MDU Rohtak in 1998

M.Tech. (Semiconductor Technology) from IIT Kharagpur in 2002

PDF (Semiconductor Technology) from Innovations for High Performance Microelectronics, Frankfurt (O), Germany in 2010

Ph.D. (Semiconductor Technology) from Brandenburg University of Technology, Cottbus, Germany in 2006

  • Lifetime Member of Breakthrough Science Society of India
  • Lifetime Member of Materials Research Society of India
  • Personal Homepage: rsohal.webs.com
  • Srijan Award of Academic Excellence - 2019
  • Research Fellowship for Young Scientist in Germany - 2005
  • MHRD GATE Fellowship at IIT Kharagpur
  • GATE Qualified in Physics
  • Principals Appreciation for active role in admissions 2020
  • Rare earth based aluminates for high - k and resistive switching RAMs applications.
  • National Science Week 2020 (Duration: One Week)
  • World Environment Day 2020 (Duration: One Day)
  • National Science Week 2021 Sponsored by MPCST Bhopal (Duration: One week)
  • National Science Week 2019 Sponsored by MPCST Bhopal (Duration: One week)
S.No.Title of FDP/STTPOrganized ByOrganized AtApproved ByDuration
1Leadership and Excellence in Higher EducationRCPETs R. C. Patel Arts, Commerce and Science College, ShirpurOnlineAICTE Training And Learning (ATAL) AcademyOne Week
23-Aug-2021
to
27-Aug-2021
2Novel Materials for Next GenerationsNALLAMUTHU GOUNDER MAHALINGAM COLLEGEOnlineAICTE Training And Learning (ATAL) AcademyOne Week
26-Jul-2021
to
30-Jul-2021
S.No.Title of PublicationJournalMonth-Year of PublicationISSN & DOINo. of Co-Authors
1Improving the dielectric constant of Al2O3 by cerium substitution for high-k MIM applicationsSurface ScienceFeb-20100039-60285
2Comparative study of NH4OH and HCl etching behaviours on AlGaN surfacesApplied Surface ScienceFeb-20100169-43322
3Pulse induced low power resistive switching in HfO2 metal-insulator-metal diodes for non-volatile memory applicationsJournal of Applied PhysicsJan-20091089-75509
4Thermal oxidation of chemical vapor deposited tungsten layers on Si(001) substrates for embedded non-volatile memory applicationsThin Solid FilmsJun-20090040-60903
S.No.TitleJournalMonth-Year of PublicationISSNNo. of Co-Authors
1For other publications visit: https://www.researchgate.net/profile/Rakesh_SohalSep-20210